PREPARATION, STRUCTURAL AND OPTICAL CHARACTERIZATION OF FE2O3 THIN FILM BY SILAR METHOD

• Author(s):

  V. Annalakshmi | K. Kasirajan | S. Maheswari | M. Karunakaran, C.Subbu

• Keywords:

  Thin Film, XRD, SILAR, UV-Vis Spectrophotometer, Band Gap.

• Abstract:

  Thin Film Of Fe2O3 With Thickness Of 1.2 µm Was Deposited By Successive Ionic Layer Adsorption And Reaction (SILAR) Method Onto Glass Substrates Using Ferrous Sulphate And Sodium Hydroxide As Cationic And Anionic Precursors. The X-ray Diffraction Studies

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Other Details

• Paper id:

  IJSARTV4I119554

• Published in:

  Volume: 4 Issue: 1 January 2018

• Publication Date:

  2018-01-14

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